hnology and the growing
market opportunities ahead of us," said Mark Melliar-Smith, CEO of
Molecular Imprints. "Their arrival falls on the heels of two important
milestones which also serve to highlight our growing momentum. Just over a
month ago, we introduced the industry's only high-speed, double-sided
pilot-production-ready nanopatterning system for patterned media
applications. On the semiconductor side of the business we recently
announced a sale of our new Imprio 300 system to SEMATECH, a consortium of
leading semiconductor manufacturers. Our customers will benefit from their
technical and market experience and knowledge."
Before joining Molecular Imprints, Eynon was the director of advanced
lithography process development for Samsung and the associate director of
lithography for SEMATECH. His industry experience also includes management
positions at KLA-Tencor, Photronics, DuPont Photomasks and Texas
Instruments. Hofemann previously held vice president-level roles in
marketing and business development at Photronics, ADE and Veeco Instruments
-- where he worked on HDD and emerging applications. Hofemann also held
management positions at KLA-Tencor, Semi-Gas Systems and Applied Materials.
About Molecular Imprints, Inc.
Molecular Imprints, Inc. (MII) is the technology leader for high-
resolution, low cost-of-ownership nanopatterning systems and solutions in
the hard disk drive (HDD) and semiconductor industries. MII is leveraging
its innovative Step and Flash Imprint Lithography (S-FIL(R)) with Drop-on-
Demand(TM) material application technology to become the worldwide market
and technology leader in high-volume patterning solutions for storage and
memory devices, while enabling emerging markets in optics, biotechnology,
and other industries. MII enables nanoscale patterning by delivering a
comprehensive nanopatterning solution that is affordable, compatible and
extendible to sub- 10-nanometer resolution levels. For more information,
visit
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SOURCE Molecular Imprints, Inc. Copyright©2008 PR Newswire. All rights reserved | |
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