This conference is the continuation of the previous two successful ECI conferences held in Barga, Italy in July 2007 and in Xi'An, China in July 2009, which were attended by worldwide experts and technical leaders from universities, industry, and government laboratories.
This conference is organized with the intention of again providing a forum for continued discussion on the latest developments in two of the most critical high-tech fields, i.e., Ultra Large Scale Integrated Circuits (ULSIC) and Thin Film Transistor (TFT). It is aimed at the exchange of state-of-the-art information among those involved in research, development, and production of semiconductor materials, processes, and devices. Although requirements for ULSI and TFTs are different, their basic scientific principles are the same. This conference will bring together global experts from these areas to exchange ideas and opinions on common scientific issues.
In order to focus the discussion, we chose three of the most popular technologies to include in this conference. To begin each session, invited speakers who are well-recognized experts will give their views on the technology trends. Then, other speakers will show their ways of solving individual problems and express their opinions on future directions of the technology. At the end of the session, a discussion will be held among all participating members to consolidate their agreements. On the last day, a large brainstorm session will be held where related technologies will be discussed together. The eventual goal is to develop a consensus on if and how ULSIC and TFT technologies can be consolidated with respect to materials, processes, devices, and applications in the semiconductor field.
Format of the Meeting
The weeklong conference provides morning and late afternoon/early evening sessions in which presentations are made. Available time is included during the afternoons for ad
|Contact: Kevin Korpics|
Engineering Conferences International