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SPIE Advanced Lithography will Bring Industry Focus to Next-generation Tools and Systems
Date:2/18/2013

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In addition to featured speakers and more than 560 technical talks, the event will include panel discussions on disruptive and emerging technologies, full- and half-day short courses on lithography topics, interactive poster paper receptions, and a 60-company exhibition showcasing many of the industry's top semiconductor suppliers, integrators, and manufacturers. The exhibition will run Tuesday and Wednesday, 27 and 28 February.

Plenary presentations from leaders in the lithography industry include:

  • Bill Siegle, Independent Consultant and ASML Advisory Board Member: “Contact printing to EUV: lessons learned from the art of lithography”
  • Howard Ko, Senior VP and General Manager, Synopsys Silicon Engineering Group: “The evolution of EDA alongside rapid silicon technology innovation”
  • Charles Szmanda, The Patent Practice of Szmanda & Shelnut, LLC: “The new U.S. patent law: what you need to know and how it will affect your strategy.”

Technical talks are organized into seven conferences:

  • Alternative Lithographic Technologies
  • Extreme Ultraviolet Lithography
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Resist Materials and Processing Technology
  • Optical Microlithography
  • Design for Manufacturability through Design-Process Integration
  • Advanced Etch Technology for Nanopatterning

Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections.

About SPIE
SPIE is the international society for optics and photon
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