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SPIE Advanced Lithography will Bring Industry Focus to Next-generation Tools and Systems
Date:2/18/2013

Bellingham, Washington (PRWEB) February 18, 2013

Lithography scientists, engineers, and developers -- long accustomed to working years ahead in order to meet industry needs -- face keen challenges, with meeting user expectations, enabling new capabilities, and controlling costs at the top of the list. SPIE Advanced Lithography, the premier annual forum for discussions on meeting the challenges in developing state-of-the-art lithographic tools, resists, metrology, materials characterization, and design and process integration, will bring the community together in San Jose, California, to address those issues.

The event will run 24-28 February at the San Jose Convention Center and San Jose Marriott Hotel.

Symposium chair Harry Levinson (GLOBALFOUNDRIES) said organizers anticipate interest in several topics in particular, including:

  • Designing with multi-patterning and directed self-assembly (DSA): beyond SEMs toward real chips
  • Line edge roughness: clearly a concern of many and the focus of a session in the conference on Advanced Etch Technology for Nanopatterning.
  • Resist limits: secondary electrons, tradeoffs among resolution, line-edge roughness and exposure speed.

However, Levinson noted, “To be honest, the real buzz usually comes from something unexpected, which is probably one of the best reasons for attending Advanced Lithography!”

With the presence of leaders from companies such as Intel, Samsung, ASML, Taiwan Semiconductor Manufacturing Corp., and other companies that have announced large investment strategies in new technology, “unexpected” topics might include R&D toward photonics integrated circuits versus silicon photonics, retooling for 450mm wafers, or power-source issues in EUV (extreme ultraviolet) tools.'/>"/>

Source: PRWeb
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