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Researchers image graphene electron clouds, revealing how folds can harm conductivity
Date:6/28/2011

p straight and flat, and our work is really bringing home the point of why that's so important."

"Graphene is going to be very important in electronics," said PhD candidate Brian Schultz, one of three UB graduate students who were lead authors on the Nature Communications paper. "It's going to be one of the most conductive materials ever found, and it has the capability to be used as an ultrahigh-frequency transistor or as a possible replacement for silicon chips, the backbone of current commercial electronics.

"When graphene was discovered, people were just so excited that it was such a good material that people really wanted to go with it and run as fast as possible," Schultz continued. "But what we're showing is that you really have to do some fundamental research before you understand how to process it and how to get it into electronics."

Other research partners offered the following insight into the significance of the findings:

  • Dan Fischer, NIST Material Measurement Laboratory, leader, Synchrotron Methods Group: "The NEXAFS results indicating that performance-damaging contaminants cling to graphene during processing highlights the importance of chemically sensitive advanced synchrotron measurement method developments for promoting innovation and industrial competiveness in commercial applications of nanotechnology."

  • Pat Lysaght, SEMATECH Front End Processes, senior member technical staff: "We place a premium on the power of collaboration, and this is a great example of the benefits associated with that philosophy. The unique expertise of each of the four collaborative entities has come together to forge a new understanding of subtle functionalization variations of surface graphene atoms. Our findings represent another important step toward potential industrial applications such as low-cost broadband radio frequency (RF) devices, and correlation of NEXAFS with Raman spectroscopy which may enhance monitorin
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Contact: Charlotte Hsu
chsu22@buffalo.edu
716-645-4655
University at Buffalo
Source:Eurekalert  

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