A University of Washington lab has been working for more than a decade on fusion energy, harnessing the energy-generating mechanism of the sun. But in one of the twists of scientific discovery, on the way the researchers found a potential solution to a looming problem in the electronics industry.
To bring their solution to market two UW engineers have launched a startup, Zplasma, that aims to produce the high-energy light needed to etch the next generation of microchips.
"In order to get smaller feature sizes on silicon, the industry has to go to shorter wavelength light," said Uri Shumlak, a UW professor of aeronautics and astronautics. "We're able to produce that light with enough power that it can be used to manufacture microchips."
The UW beam lasts up to 1,000 times longer than competing technologies and provides more control over the million-degree plasma that produces the light.
For more than four decades the technology industry has kept up with Moore's Law, a prediction that the number of transistors on a computer chip will double every two years. This trend has allowed ever-smaller, faster, lighter and less energy-intensive electronics. But it's hit a roadblock: the 193-nanometer ultraviolet light now being used cannot etch circuits any smaller.
The industry has determined that the future standard for making microchips will be 13.5-nanometer light, a wavelength less than 1/14 the current size that should carry the industry for years to come. Such extreme ultraviolet light can be created only from plasmas, which are high-temperature, electrically charged gases in which electrons are stripped from their nuclei.
The electronics industry is trying to produce this extreme ultraviolet light in various ways. One takes a droplet of tin and shoots it with a laser to make plasma that releases a brief spark of light. But so far this spark is too brief. Chip manufacturers use a $100 million machine to bounce light off a series of mirrors
|Contact: Hannah Hickey|
University of Washington