Date:12/13/2012

X-ray photoelectron spectroscopy and scanning tunneling microscopy, the group found that the formation of the hydrogen layer was rapid enough to restrict deposition to the formation of a single layer of platinum atoms. The team further discovered that by pulsing the applied voltage, they could selectively remove the hydrogen layer to enable the platinum deposition process to be repeated to form another layer.

The deposition process occurs in a single plating bath and is surprisingly fast1,000 times faster than making comparable films using molecular beam epitaxy, for example. It's also faster, simpler and less prone to contamination than other electrochemical techniques for depositing platinum films, making it much less expensive.

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Contact: Michael Baum michael.baum@nist.gov 301-975-2763 National Institute of Standards and Technology (NIST) Source:Eurekalert

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