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Job-related stress: NIST demonstrates fatigue effects in silicon
Date:11/27/2007

Researchers at the National Institute of Standards and Technology (NIST) have demonstrated a mechanical fatigue process that eventually leads to cracks and breakdown in bulk silicon crystalsa phenomenon thats particularly interesting because it long has been thought not to exist. Their recently published* results have important implications for the design of new silicon-based micro-electromechanical system (MEMS) devices that have been proposed for a wide variety of uses.

Siliconthe backbone of the semiconductor industryis one the worlds most heavily studied materials, and it has long been believed to be immune to fatigue from cyclic stresses because of the nature of its crystal structure and chemical bonds. And indeed, conventional tests have validated this. Recent research into silicon MEMS devices, however, has revealed that these microscopic systems that incorporate tiny gears, vibrating reeds and other mechanical features do seem to develop stress-induced cracks that can lead to failure. Why this happens at the microscopic scale is a matter of debate. One school of thought holds that the effect is purely mechanical, due to friction, and the other argues that it essentially is caused by corrosiona chemical effect. Because the effect has only been noticed at submicrometer scales, it has been difficult to determine which theory is correct.

A materials resistance to crackingreferred to as toughness by materials scientistsis measured customarily by taking a sample of the material, slightly notching one edge, and pulling on the ends repetitively to see if the tensile stress causes the notch to grow into a crack. Bulk silicon always has passed this test. But, argued the NIST team, in real-world MEMS devices the stresses are likely to be much more complicated.

To test this, they used an alternate method: pressing the top of test crystals with tiny tungsten-carbide spheres about 3 mm in diameter at pressures below the silicons breakin
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Contact: Michael Baum
michael.baum@nist.gov
301-975-2763
National Institute of Standards and Technology (NIST)  
Source:Eurekalert

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Job-related stress: NIST demonstrates fatigue effects in silicon
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