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Graphene films clear major fabrication hurdle
Date:4/8/2010

final product was a single-layer graphene film on a bare dielectric.

"This is exciting news for electronic applications because chemical vapor deposition is a technique already widely used in the semiconductor industry," Zhang says. "Also, we can learn more about the growth of graphene on metal catalyst surfaces by observing the evolution of the films after the evaporation of the copper. This should lay an important foundation for further control of the process and enable us to tailor the properties of these films or produce desired morphologies, such as graphene nanoribbons."

Zhang and his colleagues have reported their findings in the journal Nano Letters in a paper titled, "Direct Chemical Vapor Deposition of Graphene on Dielectric Surfaces." Other co-authors of this paper were Ariel Ismach, Clara Druzgalski, Samuel Penwell, Maxwell Zheng, Ali Javey and Jeffrey Bokor, all with Berkeley Lab.

In their study, Zhang and his colleagues used electron-beam evaporation to deposit copper films ranging in thickness from 100 to 450 nanometers. Copper was chosen because as a low carbon solubility metal catalyst it was expected to allow better control over the number of graphene layers produced. Several different dielectric substrates were evaluated including single-crystal quartz, sapphire, fused silica and silicon oxide wafers. CVD of the graphene was carried out at 1,000 degrees Celsius in durations that ranged from 15 minutes up to seven hours.

"This was done to allow us to study the effect of film thickness, substrate type and CVD growth time on the graphene formation," Zhang says.

A combination of scanning Raman mapping and spectroscopy, plus scanning electron and atomic force microscopy confirmed the presence of continuous single-layer graphene films coating metal-free areas of dielectric substrate measuring tens of square micrometers.

"Further improvement on the control of the dewetting and evaporatio
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Contact: Lynn Yarris
lcyarris@lbl.gov
510-486-5375
DOE/Lawrence Berkeley National Laboratory
Source:Eurekalert  

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