One Chicago skyline is dazzling enough. Now imagine 15,000 of them.
A Northwestern University research team has done just that -- drawing 15,000 identical skylines with tiny beams of light using an innovative nanofabrication technology called beam-pen lithography (BPL).
Details of the new method, which could do for nanofabrication what the desktop printer has done for printing and information transfer, will be published Aug. 1 by the journal Nature Nanotechnology.
The Northwestern technology offers a means to rapidly and inexpensively make and prototype circuits, optoelectronics and medical diagnostics and promises many other applications in the electronics, photonics and life sciences industries.
"It's all about miniaturization," said Chad A. Mirkin, George B. Rathmann Professor of Chemistry in the Weinberg College of Arts and Sciences and director of Northwestern's International Institute for Nanotechnology. "Rapid and large-scale transfer of information drives the world. But conventional micro- and nanofabrication tools for making structures are very expensive. We are trying to change that with this new approach to photolithography and nanopatterning."
Using beam-pen lithography, the researchers patterned 15,000 replicas of the Chicago skyline (featuring the Willis Tower and the John Hancock Center) simultaneously in about half an hour. Fifteen thousand tiny pens deposit the skylines over square centimeters of space. Conventional nanopatterning technologies, such as electron-beam lithography, allow one to make similarly small structures but are inherently low throughput and do not allow one to do large-area nanofabrication.
Each skyline pattern is made up of 182 dots, with each dot approximately 500 nanometers in diameter, like each pen tip. The time of light exposure for each dot was 20 seconds. The current method allows researchers to make structures as small as 150 nanometers, but refinements o
|Contact: Megan Fellman|