Bellingham, Washington (PRWEB) June 18, 2013
A new look at “big glass” and visionary perspectives on complex materials, costs and other trends will highlight technical sessions at SPIE Photomask Technology 2013 in Monterey, California this fall. In its 33rd year, the three-day event is the industry’s largest mask meeting and includes an exhibition of key suppliers, approximately 100 technical presentations and numerous networking lunches and receptions. Sponsored by SPIE, the international society for optics and photonics, the meeting will be held at the Monterey Conference Center and Monterey Marriott, 10-12 September.
“This annual meeting continues to be the premier worldwide technical meeting for the photomask industry and provides a condensed and up-to-date overview of trends and best practices,” said 2013 Symposium Chair Thomas Faure (IBM Corp.). “Session topics will span current technical issues, emerging technologies and future trends and give authors the opportunity to present research findings on the emerging technical challenges facing the industry to a large international audience of their peers.”
Among sessions “not to be missed,” Faure said, is the opening keynote talk by Michael Mayberry, Corporate VP of the Technology and Manufacturing Group and Director of Components Research at Intel Corp. Mayberry will survey the complex issues including materials, functional compatibility, performance-power metrics and cost needing to be solved to meet needs of the future.
Sessions will cover topics such as OPC/simulation, mask contamination and long-term durability, and one-beam direct write. With EUV masks now part of the mainstream of mask technology, all individual ma
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