Research and Development
In 2009, our research and development expenses were $160.8 million, which represented 15.0% of our sales.
The research and development efforts were focused primarily on our logic
platform and system-on-chip (SOC) applications. SMIC in 2009 has achieved many
significant milestones. Early on in the year, Synopsis and SMIC released an
enhanced 90-nanometer hierarchical, multi-voltage RTL-to-GDSII reference
design flow that will provide advanced synthesis with built-in capability of
design-for-test (DFT) and design-for-manufacturing (DFM). In April 2009,
working with a leading Chinese domestic fabless company, we developed a
90-nanometer digital photo frame chip, which is the most integrated multimedia
SOC in the market. For advanced CMOS logic, SMIC demonstrated a silicon
success in our 45-nanometer process ahead of schedule, and also added new IP
libraries in 65-nanometer and 90-nanometer technology nodes. In addition, the
Company successfully developed the 0.11 micron CMOS image sensor (CIS) process
technology, one of the advanced process technologies for CIS currently
available in the industry. In Non-Volatile Memory (NVM) technology, the
0.13-micron ETox products went into production in early 2009 and 90-nanometer
ETox products are currently in risk production.
|SOURCE Semiconductor Manufacturing International Corporation|
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